000 | 00849nam a2200265u 4500 | ||
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001 | 00851523 | ||
003 | PWmBRO | ||
005 | 20240602101941.0 | ||
008 | 880603s1988 nyua b 10100 eng | ||
010 | _a90011068 | ||
020 | _a0883183676 | ||
090 | 0 | _b621.3/81/D422 | |
245 | 0 | 0 |
_aDeposition and growth : _blimits for microelectronics, Anaheim, CA, 1987 / _ceditor, G.W. Rubloff. |
260 | 0 |
_aNew York : _bAmerican Institute of Physics, _c1988. |
|
300 |
_a388 p. : _bill. |
||
440 | 0 |
_aAmerican Vacuum Society series ; _v4 |
|
490 | 1 |
_aAmerican Institute of Physics conference proceedings ; _vno. 167 |
|
650 | 0 | _aThin films. | |
650 | 0 |
_aMicroelectronics _xMaterials. |
|
700 | 1 | 0 | _aRubloff, G. W. |
710 | 2 | 0 | _aAmerican Institute of Physics. |
830 | 0 |
_aAIP conference proceedings. _vno. 167. |
|
942 | _2ddc | ||
994 | 0 | 1 | _a072417 |
999 |
_c50918 _d50918 |