000 00849nam a2200265u 4500
001 00851523
003 PWmBRO
005 20240602101941.0
008 880603s1988 nyua b 10100 eng
010 _a90011068
020 _a0883183676
090 0 _b621.3/81/D422
245 0 0 _aDeposition and growth :
_blimits for microelectronics, Anaheim, CA, 1987 /
_ceditor, G.W. Rubloff.
260 0 _aNew York :
_bAmerican Institute of Physics,
_c1988.
300 _a388 p. :
_bill.
440 0 _aAmerican Vacuum Society series ;
_v4
490 1 _aAmerican Institute of Physics conference proceedings ;
_vno. 167
650 0 _aThin films.
650 0 _aMicroelectronics
_xMaterials.
700 1 0 _aRubloff, G. W.
710 2 0 _aAmerican Institute of Physics.
830 0 _aAIP conference proceedings.
_vno. 167.
942 _2ddc
994 0 1 _a072417
999 _c50918
_d50918