Deposition and growth :  limits for microelectronics, Anaheim, CA, 1987 / 
editor, G.W. Rubloff. 
 - New York :  American Institute of Physics,  1988. 
 - 388 p. :  ill. 
 - American Vacuum Society series ;  4 .
 - American Institute of Physics conference proceedings ;  no. 167 .
 - AIP conference proceedings.  no. 167. .
<br/><br/><label>ISBN: </label>0883183676 
<br/><br/><label>LCCN: </label>90011068 
<br/><br/><label>Subjects--Topical Terms: </label><br/>Thin films.<br/>Microelectronics--Materials.